Central Glass Company, Limited

Tokyo Electron Limited

Neriki Valve Co., Ltd.

Tatsuo Miyazaki

Akifumi Yao

Mitsuhiro Tachibana

Akiou Kikuchi

Isamu Mori

Tomonori Umezaki

Jun Lin

Kunihiro Yamauchi

Masaru Takeda

Nobuyuki Tokunaga

Kazuaki Nishimura

Koji Takeya

Hiromi Kawamoto

Yosuke Nakamura

Keita Nakahara

Takashi Kashiwaba

Tsutomu Nanmyo

Hiroshi Ono

Kenji Tanaka

Susumu Yamauchi

Takuya Kita

Kenji Isoyama

Tatsuya Irie

Koichi Kaminaga

Koji Miyazaki

Koichi Saji

The etching method of the present invention includes the step of supplying a first mixed gas containing a &#x3b2;-diketone-containing etching gas and a nitrogen oxide gas to a target having, on a surface, both a first metal film containing cobalt, iron, or manganese and a second metal film containing copper, thereby selectively etching the first metal film over the second metal film, or the step of supplying a second mixed gas containing a &#x3b2;-diketone-containing etching gas and oxygen gas to the target, thereby selectively etching the second metal film over the first metal film.

Etching method and etching device

An etching method includes a step of etching a cobalt film formed on a surface of a target object by supplying an etching gas containing &#x3b2;-diketone and an oxidizing gas for oxidizing the cobalt film to the target object. The supply of the etching gas and the oxidizing gas is carried out such that a flow rate ratio of the oxidizing gas to the etching gas is ranging from 0.5% to 50% while heating the target object to a temperature lower than or equal to 250&#xb0; C.

Etching method and etching apparatus

A fluorine gas generating devicewhich is characterized by having a cylindrical memberfor circulating therein the main-product gas, a gas feed portfor introducing the main-product gas into the cylindrical member, a gas discharge portfor discharging the main-product gas from the cylindrical member, an adsorbent holding memberarranged in the cylindrical memberto form a space to provide a channel for the main-product gas circulated in the cylindrical member, a stirring bladefor stirring the main-product gas that is introduced through the gas feed port, and a gas flow guiding cylinderfor circulating or diffusing the main-product gas in the space within the cylindrical member

Fluorine gas generator

Disclosed is a method for producing a Trifluoromethanesulfonic anhydride, which is characterized by that a reaction is conducted while kneading a Trifluoromethanesulfonic acid and diphosphorus pentoxide at a temperature that is 40&#xb0; C. or higher and is lower than 100&#xb0; C. by using a kneader-type reactor having a maximum power of 1.0 kW or greater per an actual capacity of 100 L and equipped with at least two-shaft blades, that the Trifluoromethanesulfonic anhydride to be generated is discharged, and that, while the residue in the reactor after the discharge is kneaded at a temperature that is 100&#xb0; C. or higher and is lower than 140&#xb0; C., the unreacted Trifluoromethanesulfonic acid is discharged, recovered and reused as the raw material. It is possible by this method to obtain a Trifluoromethanesulfonic anhydride with a high yield.

Method for producing trifluoromethanesulfonic anhydride

Disclosed is a method for producing a fluoroalkanesulfonic acid including (1) the step of reacting concentrated sulfuric acid and/or fuming sulfuric acid with a fluoroalkanesulfonate to cause an acid decomposition, thereby obtaining a reaction mixture containing the fluoroalkanesulfonic acid and a sulfur component; and (2) the step of adding an oxidizing agent to the reaction mixture obtained by the above step and then conducting a distillation, thereby obtaining the fluoroalkanesulfonic acid from the reaction mixture. It is possible by this method to efficiently reduce the sulfur component, thereby industrially advantageously obtaining fluoroalkanesulfonic acid of high purity.

Fluoroalkanesulfonic acid production method

A fluorine gas generating apparatus generating a fluorine gas by electrolyzing hydrogen fluoride in molten salt, includes: an electrolytic cell including, above a liquid level of molten salt, a first gas chamber into which a product gas mainly containing the fluorine gas generated at an anode immersed in the molten salt and a second gas chamber separated from the first gas chamber into which a byproduct gas mainly containing a hydrogen gas generated at a cathode immersed in the molten salt; a hydrogen fluoride supply source retaining hydrogen fluoride to be replenished in the electrolytic cell; a refining device trapping a hydrogen fluoride gas evaporated from the molten salt in the electrolytic cell and mixed in the product gas generated from the anode to refine the fluorine gas; and a recovery facility conveying and recovering the hydrogen fluoride trapped in the refining device in the electrolytic cell or the hydrogen fluoride supply source.

Fluorine gas generating apparatus

A fluorine gas generating apparatus includes an electrolytic cell where the molten salt is retained and which is separated and divided above the liquid level of the molten salt into a first gas chamber where a product gas mainly containing a fluorine gas generated at an anode immersed in the molten salt is led and a second gas chamber where a byproduct gas mainly containing a hydrogen gas generated at a cathode immersed in the molten salt is led, and a refining device refining the fluorine gas by coagulating with a cooling medium and trapping a hydrogen fluoride gas evaporated from the molten salt in the electrolytic cell and mixed in the product gas generated from the anode. The cooling medium for coagulation of the hydrogen fluoride gas in the refining device and discharged is re-used as a utility gas used at spots in the fluorine gas generating apparatus.

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Ube, Japan

Tatsuo Miyazaki