Location History:
- Ube, JP (2018 - 2022)
- Yamaguchi, JP (2018 - 2023)
Company Filing History:
8 out of 1,001 
3 out of 10,326 
1 out of 607 
Years Active: 2018-2025
Title: **Kunihiro Yamauchi: Innovator in Semiconductor Etching Technologies**
Introduction
Kunihiro Yamauchi, an accomplished inventor based in Ube, Japan, has made significant contributions to the field of semiconductor manufacturing through his innovative etching methods. With a portfolio of seven patents, he has established himself as a leading figure in the development of new technologies that enhance the efficiency and effectiveness of semiconductor devices.
Latest Patents
Among his latest patents, Kunihiro's work on the "Dry Etching Method" stands out. This method etches a metal film formed on a surface of a workpiece by bringing etching gases, each containing a β-diketone, into contact with the metal film. It includes a two-step process: a first etching step using a first β-diketone gas, followed by a second etching step utilizing a second β-diketone that forms a complex with a lower sublimation point. Additionally, his patent for a dry etching method involving a β-diketone-filled container has gained attention. This method is designed to etch a metal film while minimizing variations in the etching rate, providing consistent results throughout the use of the container.
Career Highlights
Throughout his career, Kunihiro Yamauchi has worked with notable companies in the semiconductor industry, including Central Glass Company, Limited and Tokyo Electron Limited. His expertise and innovative thinking have played a crucial role in advancing the technologies utilized in semiconductor device manufacturing.
Collaborations
Kunihiro has collaborated with esteemed colleagues such as Akifumi Yao and Jun Lin. Their joint efforts have led to advancements in etching technologies and have contributed to the reputation of Kunihiro as a respected inventor in the field.
Conclusion
With his extensive patent portfolio and collaborative efforts, Kunihiro Yamauchi continues to push the boundaries of semiconductor manufacturing technology. His inventions, particularly in dry etching methods, are shaping the future of the industry, reflecting his commitment to innovation and excellence.