The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 18, 2018

Filed:

Sep. 05, 2017
Applicants:

Hitachi Kokusai Electric Inc., Tokyo, JP;

Central Glass Co., Ltd., Ube-shi, Yamaguchi, JP;

Inventors:

Kenji Kameda, Toyama, JP;

Masaya Nagato, Toyama, JP;

Akiou Kikuchi, Ube, JP;

Yuta Takeda, Ube, JP;

Kunihiro Yamauchi, Ube, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/52 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4405 (2013.01); C23C 16/40 (2013.01); C23C 16/402 (2013.01); C23C 16/45523 (2013.01); C23C 16/45525 (2013.01); C23C 16/52 (2013.01);
Abstract

There is provided a cleaning method improving cleaning efficiency in a process container after an oxygen-containing film forming process is having performed, including: (a) supplying at least a hydrogen fluoride gas into the process container; and (b) supplying an alcohol into the process container in a state where supply of the hydrogen fluoride gas into the process container is stopped, wherein (a) and (b) are continuously performed without providing an intermittent period therebetween.


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