The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2025
Filed:
Apr. 26, 2022
Applicant:
Central Glass Company, Limited, Yamaguchi, JP;
Inventors:
Assignee:
CENTRAL GLASS COMPANY, LIMITED, Yamaguchi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3065 (2006.01); C09K 13/00 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3065 (2013.01); C09K 13/00 (2013.01); H01L 21/31122 (2013.01);
Abstract
The present disclosure aims to provide a surface treatment method using a gas composition capable of removing a metal nitride at low temperatures without using plasma. The present disclosure relates to a surface treatment method including bringing a β-diketone and NOinto contact with a surface of a workpiece.
Kitayama, Hikaru. (2025). Surface treatment method, dry etching method, cleaning method, semiconductor device manufacturing method, and etching device (U.S. Patent No. 12417922). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12417922
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile