Location History:
- Kyungki-do, KR (2008 - 2009)
- Bucheon-si, KR (2009 - 2015)
- Gyeonggi-do, KR (2017)
Company Filing History:
Years Active: 2008-2017
Title: **Inventor Spotlight: Jae-Woo Lee**
Introduction
Jae-Woo Lee, an esteemed inventor based in Bucheon-si, South Korea, has made significant contributions to the field of semiconductor fabrication. With an impressive portfolio of 12 patents, Lee's innovations focus on the development of materials and methods vital for advanced lithographic processes.
Latest Patents
Among his latest patents, two notable inventions stand out. The first is titled "Compound and composition for forming lower film of resist pattern, and method for forming lower film using same," which discloses a compound and composition used in directed self-assembly processes of block copolymers. This invention is essential for the formation of resist patterns in semiconductor lithography.
The second significant patent is "Phenol monomer, polymer for forming a resist underlayer film including same, and composition for a resist underlayer film including same." This patent introduces a phenolic monomer utilized in lithographic processes, providing a novel polymer for preparing resist under-layers, which enhances the reliability and effectiveness of the lithographic techniques in semiconductor applications.
Career Highlights
Jae-Woo Lee has been a vital contributor to Dongjin Semichem Co., Ltd., where he applies his expertise in chemistry and materials science. His work has led to substantial advancements in semiconductor technology, reflecting the tireless efforts of an inventor dedicated to pushing the boundaries of innovation.
Collaborations
Collaboration with talented coworkers such as Jae-Hyun Kim and Jung-Youl Lee has further enriched Lee's inventive journey. Working in a dynamic team environment has allowed for the exchange of ideas and strategies, fostering an atmosphere of creativity and collaboration that is essential in the fast-paced world of technology and research.
Conclusion
Jae-Woo Lee exemplifies the spirit of innovation that drives technological advancement in the semiconductor industry. With a focus on developing new materials and methods, his contributions continue to shape the future of lithographic processes. As an inventor, he remains dedicated to exploring new possibilities that will enhance efficiency and effectiveness in semiconductor fabrication.