The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2011
Filed:
Sep. 11, 2008
Jae-woo Lee, Bucheon-Si, KR;
Min-ja Yoo, Boryeong-Si, KR;
Jun-gyeong Lee, Daejeon, KR;
Young-bae Lim, Hwaseong-Si, KR;
Jae-hyun Kim, Seoul, KR;
Jae-Woo Lee, Bucheon-Si, KR;
Min-Ja Yoo, Boryeong-Si, KR;
Jun-Gyeong Lee, Daejeon, KR;
Young-Bae Lim, Hwaseong-Si, KR;
Jae-Hyun Kim, Seoul, KR;
Dongjin Semichem Co., Ltd., Incheon, KR;
Abstract
A photosensitive compound whose size is smaller than conventional polymer for photoresist, and which has well-defined (uniform) structure, and a photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula 1. Also, the photoresist composition comprises 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to 15 weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 200 to 5000 weight parts of an organic solvent. In the formula 1, x is 1, 2, 3, 4 or 5, y is 2, 3, 4, 5 or 6, and R and R' are independently a chain type or a ring type of aliphatic or aromatic hydrocarbon group of 1 to 30 carbon atoms.