The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2009
Filed:
Sep. 10, 2007
Deog-bae Kim, Seoul, KR;
Jung-youl Lee, Anyang-si, KR;
Geun-jong Yu, Jeonju-si, KR;
Sang-jung Kim, Incheon, KR;
Jae-woo Lee, Bucheon-si, KR;
Jae-hyun Kim, Seoul, KR;
Deog-Bae Kim, Seoul, KR;
Jung-Youl Lee, Anyang-si, KR;
Geun-Jong Yu, Jeonju-si, KR;
Sang-Jung Kim, Incheon, KR;
Jae-Woo Lee, Bucheon-si, KR;
Jae-Hyun Kim, Seoul, KR;
Dongjin Semichem Co., Ltd., Incheon, KR;
Abstract
The photoresist monomer including an oxime group, a polymer thereof and a photoresist composition containing the same are disclosed. The photoresist monomer is represented by following Formula. In Formula, R* is independently a hydrogen or a methyl group, and R is a substituted or unsubstituted C˜Calkyl group with or without an ether group, or a substituted or unsubstituted C˜Chydrocarbon group including an aryl group, a heteroaryl group, a cycloalkyl group or a multicycloalkyl group with or without an ether group, a ketone group or a sulfur.