The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2010
Filed:
Jun. 06, 2008
Applicants:
Jae-woo Lee, Bucheon-Si, KR;
Jung-youl Lee, Anyang-Si, KR;
Jeong-sik Kim, Yeongiu-Si, KR;
Eu-jean Jang, Hwaseong-Si, KR;
Jae-hyun Kim, Seoul, KR;
Inventors:
Jae-Woo Lee, Bucheon-Si, KR;
Jung-Youl Lee, Anyang-Si, KR;
Jeong-Sik Kim, Yeongiu-Si, KR;
Eu-Jean Jang, Hwaseong-Si, KR;
Jae-Hyun Kim, Seoul, KR;
Assignee:
Dongjin Semichem Co., Ltd., Incheon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract
Disclosed are a photo-sensitive compound and a photoresist composition containing the same, for forming ultra-fine photoresist patterns. The photo-sensitive compound is resented by following Formula 1,
Quick Actions:
Lee, Jae-Woo. (2010). Photo-sensitive compound and photoresist composition including the same (U.S. Patent No. 7695893). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7695893
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