Company Filing History:
Years Active: 2010-2012
Title: Innovations of Eu-Jean Jang in Semiconductor Technology
Introduction
Eu-Jean Jang is a prominent inventor based in Hwaseong-si, South Korea, known for his innovative contributions to the field of semiconductor technology. With a total of three patents registered, his work has significantly impacted the efficiency and capability of semiconductor manufacturing processes.
Latest Patents
Among his latest patents, one of the most notable is the "Method for forming fine pattern in semiconductor device." This invention presents a novel approach to manufacturing fine patterns in semiconductor devices using a double exposure patterning process. The method improves the efficiency of creating second photoresist patterns by eliminating the need for an exposure mask, thus simplifying the manufacturing process.
Another significant patent is the "Photosensitive molecular compound and photoresist composition including the same." This invention features a photosensitive compound that contains an oxime group, which decomposes directly under light exposure. This molecular resist boasts sizes smaller than conventional polymers used for photoresist, offering advancements in precision and effectiveness in semiconductor applications.
Career Highlights
Currently, Eu-Jean Jang is associated with Dongjin Semichem Co., Ltd., where he continues to innovate and develop cutting-edge technologies in the semiconductor field. His focus on enhancing manufacturing processes through his patents underscores his importance in the industry.
Collaborations
Throughout his career, Eu-Jean Jang has worked alongside notable colleagues such as Jung-Youl Lee and Jae-Woo Lee. Their collaborative efforts have contributed to several advancements in semiconductor technologies, further enhancing the capabilities of their respective company.
Conclusion
Eu-Jean Jang's contributions to semiconductor technology illustrate the ever-evolving landscape of innovation in this field. With his patents addressing fundamental challenges in semiconductor manufacturing, he continues to play a vital role in driving the industry forward. His work not only exemplifies individual creativity but also emphasizes the importance of collaboration in achieving remarkable advancements in technology.