The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2017
Filed:
Sep. 12, 2013
Applicant:
Dongjin Semichem Co., Ltd., Incheon, KR;
Inventors:
Su-Young Han, Gyeonggi-do, KR;
Jung-Youl Lee, Gyeonggi-do, KR;
Jae-Woo Lee, Gyeonggi-do, KR;
Jae-Hyun Kim, Seoul, KR;
Assignee:
DONGJIN SEMICHEM CO., LTD., Incheon, KR;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); H01L 21/027 (2006.01); G03F 7/09 (2006.01); G03F 7/00 (2006.01); G03F 7/16 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
G03F 7/091 (2013.01); G03F 7/0002 (2013.01); G03F 7/168 (2013.01); G03F 7/40 (2013.01); H01L 21/0271 (2013.01);
Abstract
Disclosed are a compound and composition for forming a lower film, which are used in a process for forming a resist pattern by means of the directed self-assembly of a block copolymer (BCP). Also disclosed is a method for forming a lower film using same. The compound for forming a lower film of a resist pattern according to the present invention has the structure of formula 1 of claim
Han, Su-Young. (2017). Compound and composition for forming lower film of resist pattern, and method for forming lower film using same (U.S. Patent No. 9651867). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9651867
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile