This inventor holds 1 USPTO granted patent. Top assignee: Dongjin Semichem Co., Ltd.. Active years: 2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017
Title: Su-Young Han: Innovator in Resist Pattern Technology
Introduction
Su-Young Han is a notable inventor based in Gyeonggi-do, South Korea. She has made significant contributions to the field of semiconductor technology, particularly in the development of materials used in resist pattern formation.
Latest Patents
Su-Young Han holds 1 patent for her invention titled "Compound and composition for forming lower film of resist pattern, and method for forming lower film using same." This patent discloses a compound and composition for forming a lower film, which is utilized in the process of creating a resist pattern through the directed self-assembly of a block copolymer (BCP). The invention also includes a method for forming the lower film using the disclosed compound.
Career Highlights
Su-Young Han is currently associated with Dongjin Semichem Co., Ltd., where she continues to advance her research and development efforts in the semiconductor industry. Her work focuses on innovative solutions that enhance the efficiency and effectiveness of resist pattern technologies.
Collaborations
Su-Young has collaborated with notable colleagues, including Jung-Youl Lee and Jae-Woo Lee, contributing to a dynamic research environment that fosters innovation and technological advancement.
Conclusion
Su-Young Han's contributions to the field of semiconductor technology exemplify her dedication to innovation and excellence. Her patent on resist pattern technology highlights her role as a leading inventor in this critical area of research.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile