The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2008
Filed:
Sep. 15, 2005
Jae-woo Lee, Kyungki-do, KR;
Jung-youl Lee, Kyungki-do, KR;
Deog-bae Kim, Kyungki-do, KR;
Jae-hyun Kim, Kyungki-do, KR;
Eun-kyung Son, Kyungki-do, KR;
Jae-Woo Lee, Kyungki-do, KR;
Jung-Youl Lee, Kyungki-do, KR;
Deog-Bae Kim, Kyungki-do, KR;
Jae-Hyun Kim, Kyungki-do, KR;
Eun-Kyung Son, Kyungki-do, KR;
Dongjin Semichem Co., Ltd., , KR;
Abstract
A photoresist polymer having a spiro cyclic ketal group, and a photoresist composition including the same is disclosed. The photoresist polymer and the photoresist composition can improve the resolution and the process margin due to its low activation energy of the deprotection reaction of the spiro cyclic ketal group, and can produce fine photoresist patterns due to its low PEB (Post Exposure Baking) temperature sensitivity.