Location History:
- Kyungki-do, KR (2008)
- Hwaseong, KR (2008)
Company Filing History:
Years Active: 2008
Title: The Innovative Contributions of Eun-Kyung Son
Introduction
Eun-Kyung Son, a prominent inventor based in Kyungki-do, South Korea, has made significant strides in the field of photoresist materials. With a total of two patents to her name, her innovations are at the forefront of advancements in photoresist technology.
Latest Patents
Eun-Kyung Son's latest patents include groundbreaking inventions aimed at enhancing the performance of photoresist compositions. The first patent is related to a photoresist monomer featuring a spiro cyclic ketal group. This innovation allows for improved resolution and process margin due to its low activation energy during the deprotection reaction, making it instrumental in producing fine photoresist patterns while maintaining low sensitivity to post-exposure baking temperatures.
The second patent revolves around a chemically amplified polymer that includes a pendant group with dicyclohexyl. This invention introduces a novel (meth)acrylic or norbornene carboxylate compound with dicyclohexyl, leading to the synthesis of a chemically amplified polymer that demonstrates high resolution and excellent etching resistance. These advancements play a crucial role in the development of positive photoresist compositions for ArF lithography.
Career Highlights
Eun-Kyung Son is currently employed at Dongjin Semichem Co., Ltd., where she has made impactful contributions to the company's research and development efforts. Her work focuses on advancing the capabilities of photoresist materials, which are vital for the semiconductor industry and beyond.
Collaborations
Throughout her career, Eun-Kyung Son has collaborated with talented colleagues such as Deog-Bae Kim and Jae-Hyun Kim. These partnerships have fostered a creative environment that enhances innovation and leads to remarkable achievements in their field.
Conclusion
Eun-Kyung Son stands out as a trailblazer in the technology sector, particularly in the realm of photoresist materials. Her patents not only signify her inventive prowess but also reflect her commitment to advancing the capabilities of this essential technology in modern manufacturing. As she continues her work at Dongjin Semichem Co., Ltd., her contributions to the industry are sure to make a lasting impact.