The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2008
Filed:
Nov. 19, 2002
Eun-kyung Son, Hwaseong, KR;
Jae-hyun Kang, Hwaseong, KR;
Deog-bae Kim, Hwaseong, KR;
Jae-hyun Kim, Hwaseong, KR;
Eun-Kyung Son, Hwaseong, KR;
Jae-Hyun Kang, Hwaseong, KR;
Deog-Bae Kim, Hwaseong, KR;
Jae-Hyun Kim, Hwaseong, KR;
DongJin Semichem Co., Ltd., Seo-Ku, Incheon, KR;
Abstract
The present invention relates to a chemically amplified polymer having a pendent group with dicyclohexyl bonded thereto, a process for the preparation thereof, and a resist composition comprising it, and more particularly, to a novel (meth)acrylic or norbornene carboxylate compound with dicyclohexyl bonded thereto, a process for the preparation thereof, a chemically amplified polymer synthesized therewith, and a positive photoresist composition for ArF comprising said polymer, with high resolution and excellent etching resistance.