The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2011
Filed:
Jul. 17, 2008
Jung-youl Lee, Anyang-Si, KR;
Min-ja Yoo, Boryeong-si, KR;
Jeong-sik Kim, Hwaseong-Si, KR;
Young-bae Lim, Hwaseong-Si, KR;
Jae-woo Lee, Bucheon-Si, KR;
Jae-hyun Kim, Seoul, KR;
Jung-Youl Lee, Anyang-Si, KR;
Min-Ja Yoo, Boryeong-si, KR;
Jeong-Sik Kim, Hwaseong-Si, KR;
Young-Bae Lim, Hwaseong-Si, KR;
Jae-Woo Lee, Bucheon-Si, KR;
Jae-Hyun Kim, Seoul, KR;
Dongjin Semichem Co., Ltd., Incheon, KR;
Abstract
An acid-amplifier having an acetal group and a photoresist composition including the same, are disclosed. The acid-amplifier produces an acid (second acid) during a post-exposure-bake (PEB), which is induced by an acid (first acid) generated from a photo-acid generator (PAG) at the exposure process so that a line edge roughness (LER) of the photoresist pattern and photoresist energy sensitivity are improved. The acid-amplifier has a structure of following Formula 1. in Formula 1, R is C˜Cmono-cyclic or multi-cyclic saturated hydrocarbon, Ris C˜Clinear hydrocarbon, C˜Cperfluoro compound or C˜Caromatic compound, Rand Rare independently hydrogen atom or C˜Csaturated hydrocarbon and A is independently oxygen atom (O) or sulfur atom (S).