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For the Inventor, By the Inventor

San Diego, CA, United States of America

Hyeokjin Lim

This inventor holds 18 USPTO granted patents and 7 published patent applications and 2 EPO patents, primarily in CMOS Circuit Design. Top assignee: Qualcomm Incorporated. Active years: 2017-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hyeokjin Lim. Retrieved from https://idiyas.com/inventor/hyeokjin-lim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 18 

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.8

ph-index = 3

Forward Citations = 43(Granted Patents)


Company Filing History:

goldMedal18 out of 45,309 
 
Qualcomm Incorporated
 patents

Years Active: 2017-2023

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Areas of Expertise:
CMOS Circuits
Standard Cell Architecture
FET Circuits
Metal Oxide Semiconductor
Pin Accessibility
High Performance Cells
Backside Routing
Hybrid Coloring Methodology
Parasitic Resistance
Power Rail Routing
18 patents (USPTO):Explore Patents
1. 11710733 - Vertical power grid standard cell architecture (2023-07-25),
2. 11437379 - Field-effect transistors (FET) circuits employing topside and backside contacts for topside and backside routing of FET power and logic signals, and related complementary metal oxide semiconductor (CMOS) circuits (2022-09-06),
3. 11404374 - Circuits employing a back side-front side connection structure for coupling back side routing to front side routing, and related complementary metal oxide semiconductor (CMOS) circuits and methods (2022-08-02),
4. 11290109 - Multibit multi-height cell to improve pin accessibility (2022-03-29),
5. 11133803 - Multiple via structure for high performance standard cells (2021-09-28),
6. 10965289 - Metal oxide semiconductor device of an integrated circuit (2021-03-30),
7. 10784345 - Standard cell architecture for gate tie-off (2020-09-22),
8. 10777640 - Standard cell architecture for gate tie-off (2020-09-15),
9. 10692808 - High performance cell design in a technology with high density metal routing (2020-06-23),
10. 10605859 - Visible alignment markers/landmarks for CAD-to-silicon backside image alignment (2020-03-31),
11. 10600866 - Standard cell architecture for gate tie-off (2020-03-24),
12. 10490543 - Placement methodology to remove filler (2019-11-26),
13. 10236886 - Multiple via structure for high performance standard cells (2019-03-19),
14. 10175571 - Hybrid coloring methodology for multi-pattern technology (2019-01-08),
15. 9960231 - Standard cell architecture for parasitic resistance reduction (2018-05-01),

Title: The Innovative Journey of Hyeokjin Lim

Introduction: Hyeokjin Lim, a talented inventor based in San Diego, CA, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents: Hyeokjin Lim's latest patents include a cutting-edge wearable device for monitoring health metrics in real-time and a revolutionary software application for enhancing cybersecurity measures in the digital realm.

Career Highlights: With a background in computer science and engineering, Hyeokjin Lim has a proven track record of developing innovative solutions to complex technological challenges. His career highlights include receiving multiple awards for his contributions to the tech industry and being recognized as a thought leader in the field of artificial intelligence.

Collaborations: Hyeokjin Lim has collaborated with leading tech companies and research institutions to bring his inventions to life. His collaborative efforts have resulted in the successful implementation of cutting-edge technologies in various sectors, ranging from healthcare to cybersecurity.

Conclusion: In conclusion, Hyeokjin Lim's passion for innovation and his dedication to pushing the boundaries of technology have established him as a prominent figure in the world of inventors. His relentless pursuit of excellence continues to inspire the next generation of innovators to think outside the box and create a better future through groundbreaking inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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