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For the Inventor, By the Inventor

Hsinchu, Taiwan

Huai-Tei Yang

USPTO Granted Patents = 76 

Average Co-Inventor Count = 4.8

ph-index = 7

Forward Citations = 110(Granted Patents)

Forward Citations (Not Self Cited) = 96(Dec 10, 2025)


Inventors with similar research interests:


Company Filing History:

goldMedal76 out of 40,674 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2002-2025

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Areas of Expertise:
Semiconductor Devices
FinFET Technology
Epitaxial Stacks
Dopant Activation
EUV Collector Contamination
High-K Metal Gate
In-Situ Etching
Chemical Mechanical Polishing
Silicon Intermixing Layer
Vacuum Systems
P-Type Strained Channel
Etching Apparatus
76 patents (USPTO):Explore Patents
1. 12490508 - Semiconductor device and method (2025-12-02),
2. 12394624 - Silicon intermixing layer for blocking diffusion (2025-08-19),
3. 12371780 - Vacuum systems in semiconductor fabrication facilities (2025-07-29),
4. 12170202 - Formation and in-situ etching processes for metal layers (2024-12-17),
5. 12080761 - Fully strained channel (2024-09-03),
6. 12080582 - Etching apparatus and methods of cleaning thereof (2024-09-03),
7. 12021143 - P-type strained channel in a fin field effect transistor (FinFET) device (2024-06-25),
8. 12021142 - Method of forming source/drain epitaxial stacks (2024-06-25),
9. 12015055 - Doping for semiconductor device with conductive feature (2024-06-18),
10. 11990550 - Semiconductor structure with source/drain multi-layer structure and method for forming the same (2024-05-21),
11. 11973127 - Semiconductor structure with source/drain structure having modified shape (2024-04-30),
12. 11854811 - FinFET device and method of forming (2023-12-26),
13. 11817499 - P-type strained channel in a fin field effect transistor (FinFET) device (2023-11-14),
14. 11742386 - Doping for semiconductor device with conductive feature (2023-08-29),
15. 11685015 - Method and system for performing chemical mechanical polishing (2023-06-27),

Title: The Innovative Journey of Huai-Tei Yang

Introduction:

Huai-Tei Yang, a distinguished inventor hailing from Hsinchu, Taiwan, has made significant contributions to the field of technology and innovation through his groundbreaking inventions.

Latest Patents:

Huai-Tei Yang's latest patents focus on advancements in semiconductor technology, particularly in the development of cutting-edge microchips with enhanced performance and efficiency.

Career Highlights:

With a career spanning over two decades, Huai-Tei Yang has held key roles in leading tech companies, where he spearheaded research and development projects that have resulted in numerous patented inventions. His expertise in semiconductor design and manufacturing has been instrumental in shaping the industry.

Collaborations:

Throughout his career, Huai-Tei Yang has collaborated with top researchers, engineers, and industry experts to push the boundaries of technological innovation. His collaborative efforts have led to the successful development of groundbreaking products that have revolutionized the tech landscape.

Conclusion:

In conclusion, Huai-Tei Yang's relentless pursuit of innovation and his passion for pushing the limits of technology have solidified his reputation as a visionary inventor in the field of semiconductor technology. His contributions continue to inspire future generations of inventors and shape the future of technological advancements.

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