Niigata, Japan

Hiromichi Isogai

This inventor holds 9 USPTO granted patents and 1 published patent application. Top assignees: Covalent Materials Corporation, Globalwafers Japan Co., Ltd., Toshiba Ceramics Co., Ltd.. Active years: 2003-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiromichi Isogai. Retrieved from https://idiyas.com/inventor/hiromichi-isogai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 9 

% Patents Active = 77.8

Average Co-Inventor Count = 6.5

ph-index = 3

Forward Citations = 21(Granted Patents)


Location History:

  • Shibata, JP (2003 - 2006)
  • Niigata, JP (2011 - 2015)

Company Filing History:


Years Active: 2003-2015

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9 patents (USPTO):Explore Patents

Title: Hiromichi Isogai: Innovator in Silicon Wafer Technology

Introduction

Hiromichi Isogai is a prominent inventor based in Niigata, Japan. He has made significant contributions to the field of silicon wafer technology, holding a total of nine patents. His work focuses on improving the quality and performance of silicon wafers used in various electronic devices.

Latest Patents

One of Isogai's latest patents is for a silicon wafer and method for heat-treating silicon wafers. This innovation aims to prevent void defects in the bulk region of the wafer, which can lead to contamination and slip generation during device processing. The patented method reduces crystal defects, such as COP, in the active region of the device. The silicon wafer features a defect-free surface region and a bulk region that includes a polyhedron-shaped void defect, which is effectively removed through a specialized heat-treating process.

Another notable patent involves a single crystal pulling-up apparatus and method for silicon single crystals using the Czochralski method. This invention includes a neck diameter measuring portion, compensation portions for adjusting pulling-up speeds, and a crucible rotation number compensation portion to enhance the efficiency of the crystal growth process.

Career Highlights

Throughout his career, Isogai has worked with reputable companies such as Toshiba Ceramics Co., Ltd. and Globalwafers Japan Co., Ltd. His experience in these organizations has contributed to his expertise in silicon wafer technology and innovation.

Collaborations

Isogai has collaborated with notable colleagues, including Koji Izunome and Takeshi Senda. These partnerships have furthered advancements in the field and fostered a collaborative environment for innovation.

Conclusion

Hiromichi Isogai's contributions to silicon wafer technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of high-quality silicon wafers for electronic applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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