Company Filing History:
Years Active: 2007-2018
Title: Hindrik De Vries: Innovator in Barrier Layer Manufacturing
Introduction
Hindrik De Vries is a highly regarded inventor based in Tilburg, Netherlands. With a remarkable portfolio of 13 patents, he has made significant contributions to the field of materials science, particularly in the manufacturing of barrier layers for flexible substrates.
Latest Patents
Among his latest innovations are two notable patents titled "Method and device for manufacturing a barrier layer on a flexible substrate" and "Method and apparatus for manufacturing a barrier layer on a substrate." These patents detail a sophisticated process where an inorganic oxide layer, characterized by a pore volume of 0.3 to 10 vol. %, is applied to a substrate. The subsequent treatment of this substrate involves atmospheric glow discharge plasma to form a sealing layer, utilizing a specific mixture of gases and precise control over deposition rates.
Career Highlights
Hindrik has had an impressive career, working for distinguished companies such as Fujifilm Manufacturing Europe B.V. and Fuji Photo Film B.V. His work has focused on advancing the technologies related to flexible substrates, contributing to the development of better manufacturing techniques for barrier layers.
Collaborations
Throughout his professional journey, Hindrik has collaborated with esteemed colleagues, including Eugen Aldea and Mauritius Cornelius Maria Van de Sanden. These partnerships have facilitated impactful research and development in their field.
Conclusion
Hindrik De Vries serves as an inspiring figure in the realm of innovation, particularly in barrier layer manufacturing. His extensive patent portfolio showcases his commitment to advancing technology and his ability to collaborate effectively with fellow experts. The work of inventors like Hindrik plays a crucial role in shaping the future of materials science.