The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2010
Filed:
Dec. 22, 2004
Eugen Aldea, Eindhoven, NL;
Jan Bastiaan Bouwstra, Biltoven, NL;
Mauritius Cornelius Maria Van DE Sanden, Tilburg, NL;
Hindrik Willem DE Vries, Tilburg, NL;
Eugen Aldea, Eindhoven, NL;
Jan Bastiaan Bouwstra, Biltoven, NL;
Mauritius Cornelius Maria Van De Sanden, Tilburg, NL;
Hindrik Willem De Vries, Tilburg, NL;
Fuji Photo Film B.V., Tilburg, NL;
Abstract
Method and apparatus for generating and sustaining a glow discharge plasma in a plasma discharge space comprising at least two spaced electrodes. The method and apparatus are arranged for performing the steps of introducing in the discharge space a gas or gas mixture under atmospheric pressure conditions, energizing the electrodes by applying an AC energizing voltage (V) to the electrodes, and controlling the energizing voltage (V) such that at plasma generation a sharp relative decrease of displacement current is provided.