The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2012
Filed:
May. 24, 2007
Hindrik Willem DE Vries, Tilburg, NL;
Eugen Aldea, Eindhoven, NL;
Serguei Alexandrovich Starostine, Eindhoven, NL;
Mariadriana Creatore, Petten, NL;
Mauritius Cornelius Maria Van DE Sanden, Tilburg, NL;
Hindrik Willem De Vries, Tilburg, NL;
Eugen Aldea, Eindhoven, NL;
Serguei Alexandrovich Starostine, Eindhoven, NL;
Mariadriana Creatore, Petten, NL;
Mauritius Cornelius Maria Van De Sanden, Tilburg, NL;
Fujifilm Manufacturing Europe B.V., Tilburg, NL;
Abstract
Disclosed are methods for deposition of a chemical compound or element using an atmospheric pressure glow discharge plasma in a treatment space comprising two electrodes connected to a power supply for providing electrical power during an on-time (t). The treatment space is filled with a gas composition of an active and an inert gas mixture, including a precursor of the chemical compound or element to be deposited. Dust formation is prevented by using Nitrogen in the gas composition, applying short pulses and using a predetermined residence time of the gas composition in the treatment space. Best results are obtained when using a stabilized plasma.