The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2011
Filed:
Dec. 22, 2004
Hindrik Willem DE Vries, Tilburg, NL;
Eugen Aldea, Eindhoven, NL;
Jan Bastiaan Bouwstra, Biltoven, NL;
Mauritius Cornelius Maria Van DE Sanden, Tilburg, NL;
Hindrik Willem De Vries, Tilburg, NL;
Eugen Aldea, Eindhoven, NL;
Jan Bastiaan Bouwstra, Biltoven, NL;
Mauritius Cornelius Maria Van De Sanden, Tilburg, NL;
Fuji Photo Film B.V., Tilburg, NL;
Abstract
The present invention relates to a method of and arrangement for removing contaminants from a surface of a substrate by subjecting said substrate surface to an atmospheric pressure glow plasma. Said plasma is generated in a discharge space comprising a plurality of electrodes, by applying an alternating plasma energizing voltage to said electrodes causing a plasma current and a displacement current. Said plasma is stabilised by controlling said displacement current during plasma generation such that modification of properties of said substrate surface is prevented.