Fujifilm Manufacturing Europe B.v.

Fuji Photo Film B.v.

Hindrik De Vries

Eugen Aldea

Mauritius Cornelius Maria Van De Sanden

Serguei Alexandrovich Starostine

Jan Bastiaan Bouwstra

Fuyuhiko Mori

Bruno Alexander Korngold

Mariadriana Creatore

Mauritius Van De Sanden

Method and apparatus for manufacturing a barrier layer on a substrate (). An inorganic oxide layer () having a pore volume between 0.3 and 10 vol. % is provided on the substrate (). Subsequently the substrate () with the inorganic oxide layer () is treated in an atmospheric glow discharge plasma to form a sealing layer (), the plasma being generated by at least two electrodes () in a treatment space () formed between the at least two electrodes (). The treatment space () comprises in operation a mixture of a gas comprising oxygen and precursor material in an amount between 2 and 50 ppm. A local deposition rate is controlled at 5 nm/sec or lower, using a power density of 10 W/cmor higher in the treatment space ().

Method and device for manufacturing a barrier layer on a flexible substrate

The invention provides a method for manufacturing a barrier layer on a substrate, the method comprising: The invention further provides a device for manufacturing a barrier layer on a substrate.

The invention provides a method for manufacturing a barrier layer on a substrate, the method comprising: &#x2014;providing a substrate with an inorganic oxide layer having a pore volume between 0.3 and 10 vol. %; &#x2014;treating said substrate with an inorganic oxide layer in a glow discharge plasma, said plasma being generated by at least two electrodes in a treatment space formed between said two electrodes, said treatment space also being provided with a gas comprising Nitrogen compounds; and &#x2014;the treating of the substrate in said treatment space is done at a temperature below 150&#xb0; C., e.g. below 100&#xb0; C. The invention further provides a device for manufacturing a barrier layer on a substrate.

A method for manufacturing a barrier layer () on a flexible substrate (), comprising depositing an inorganic layer on the substrate in a treatment space (), the treatment space () being formed between at least two electrodes () for generating an atmospheric pressure glow discharge plasma. The barrier layer () is characterized in that it is formed by three subsequent depositions of inorganic layers on the substrate (), each layer being at most 150 nm in thickness.

Method for manufacturing a barrier layer on a substrate and a multi-layer stack

A method for manufacturing a barrier layer () on a flexible substrate (), and a sheet structure () having a combination of these elements. The method comprises depositing an inorganic layer on the substrate in a treatment space (), the treatment space () being formed between at least two electrodes () for generating an atmospheric pressure glow discharge plasma. At least three subsequent layers of the same material are deposited on the substrate (), each layer being at most 20 nm in thickness.

Method for manufacturing a barrier on a sheet and a sheet for PV modules

A method and apparatus for treatment of a substrate surface using an atmospheric pressure plasma is disclosed. The method comprises providing an atmospheric pressure plasma in a treatment space between a first electrode and a second electrode, providing a substrate in contact with the first electrode in the treatment space, and applying a plasma generating power to the first and second electrodes. The first electrode has a predefined structure of insulating areas and conductive areas for plasma treatment of surface areas of the substrate corresponding to the areas in contact with the conductive areas of the first electrode.

Method and apparatus for plasma surface treatment of moving substrate

A method and apparatus for manufacturing a multi-layer stack structure (), the structure () comprising in order: a substrate () a barrier layer () an adhesive layer () a barrier layer () a substrate (). The method comprises: a) providing two substrates () in a single treatment space (), the treatment space () comprising at least two electrodes () for generating an atmospheric pressure glow discharge plasma in the treatment space (); b) treating the facing surfaces of the two substrates () simultaneously in the single treatment space (); c) laminating the two treated substrates () with an adhesive layer () in between the facing surfaces to obtain the multi-layer stack structure ().

Method for manufacturing a multi-layer stack structure with improved WVTR barrier property

Plasma treatment apparatus and method for treatment of a surface of a substrate. A dielectric barrier discharge electrode structure is provided having a treatment space () and comprising a first electrode () and a second electrode (), and a power supply () connected to the first electrode () and the second electrode () for generating an atmospheric pressure plasma in the treatment space (). The plasma treatment apparatus further comprises a magnetic layer () provided on a surface of at least the first electrode (). The first electrode () is arranged to receive, in operation, the substrate () to be treated and a mask device () in contact with the substrate (), the mask device () interacting with the magnetic layer ().

Substrate plasma treatment using magnetic mask device

Disclosed are methods for deposition of a chemical compound or element using an atmospheric pressure glow discharge plasma in a treatment space comprising two electrodes connected to a power supply for providing electrical power during an on-time (t). The treatment space is filled with a gas composition of an active and an inert gas mixture, including a precursor of the chemical compound or element to be deposited. Dust formation is prevented by using Nitrogen in the gas composition, applying short pulses and using a predetermined residence time of the gas composition in the treatment space. Best results are obtained when using a stabilized plasma.

Method for deposition using pulsed atmospheric pressure glow discharge

The present invention relates to a method of and arrangement for removing contaminants from a surface of a substrate by subjecting said substrate surface to an atmospheric pressure glow plasma. Said plasma is generated in a discharge space comprising a plurality of electrodes, by applying an alternating plasma energizing voltage to said electrodes causing a plasma current and a displacement current. Said plasma is stabilised by controlling said displacement current during plasma generation such that modification of properties of said substrate surface is prevented.

Method of and arrangement for removing contaminants from a substrate surface using an atmospheric pressure glow plasma

Method and apparatus for generating and sustaining a glow discharge plasma in a plasma discharge space comprising at least two spaced electrodes. The method and apparatus are arranged for performing the steps of introducing in the discharge space a gas or gas mixture under atmospheric pressure conditions, energizing the electrodes by applying an AC energizing voltage (V) to the electrodes, and controlling the energizing voltage (V) such that at plasma generation a sharp relative decrease of displacement current is provided.

Method and apparatus for stabilizing a glow discharge plasma under atmospheric conditions

Method and arrangement () for generating an atmospheric pressure glow plasma APG (), where in a plurality of electrodes, () are arranged defining a discharge space () for forming said plasma (). The electrodes () are connected to a power supply () providing an AC-voltage having a frequency of at least 50 kHz to the electrodes (). A gaseous substance () is provided in said discharge space and comprises t least one of a group of argon, nitrogen and air.

Method and arrangement for generating an atmospheric pressure glow discharge plasma (APG)

Method for generating an atmospheric pressure glow plasma (APG), wherein said plasma is generated in a discharge space between a plurality of electrodes. A dielectric is present on at least one of said electrodes, said dielectric having a boundary surface with said plasma enabling interactions between said plasma and said surface. Said dielectric is arranged for releasing electrons contributing to said plasma from said surface by said interactions.

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Tilburg, Netherlands

Hindrik De Vries