The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2018
Filed:
Jun. 12, 2013
Fujifilm Manufacturing Europe Bv, Tilburg, NL;
Serguei Starostine, Tilburg, NL;
Hindrik De Vries, Tilburg, NL;
Abstract
Method and apparatus for manufacturing a barrier layer on a substrate (). An inorganic oxide layer () having a pore volume between 0.3 and 10 vol. % is provided on the substrate (). Subsequently the substrate () with the inorganic oxide layer () is treated in an atmospheric glow discharge plasma to form a sealing layer (), the plasma being generated by at least two electrodes () in a treatment space () formed between the at least two electrodes (). The treatment space () comprises in operation a mixture of a gas comprising oxygen and precursor material in an amount between 2 and 50 ppm. A local deposition rate is controlled at 5 nm/sec or lower, using a power density of 10 W/cmor higher in the treatment space ().