The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2014

Filed:

Jul. 12, 2011
Applicant:

Hindrik DE Vries, Tilburg, NL;

Inventor:

Hindrik De Vries, Tilburg, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for manufacturing a barrier layer () on a flexible substrate (), comprising depositing an inorganic layer on the substrate in a treatment space (), the treatment space () being formed between at least two electrodes () for generating an atmospheric pressure glow discharge plasma. The barrier layer () is characterized in that it is formed by three subsequent depositions of inorganic layers on the substrate (), each layer being at most 150 nm in thickness.


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