The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 30, 2007

Filed:

Jul. 19, 2002
Applicants:

Hindrik Willem DE Vries, Tilburg, NL;

Fuyuhiko Mori, Tilburg, NL;

Eugen Aldea, Tilburg, NL;

Mauritius Cornelius Maria Van DE Sanden, Tilburg, NL;

Inventors:

Hindrik Willem De Vries, Tilburg, NL;

Fuyuhiko Mori, Tilburg, NL;

Eugen Aldea, Tilburg, NL;

Mauritius Cornelius Maria Van De Sanden, Tilburg, NL;

Assignee:

Fuji Photo Film B.V., Tilburg, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Method for generating an atmospheric pressure glow plasma (APG), wherein said plasma is generated in a discharge space between a plurality of electrodes. A dielectric is present on at least one of said electrodes, said dielectric having a boundary surface with said plasma enabling interactions between said plasma and said surface. Said dielectric is arranged for releasing electrons contributing to said plasma from said surface by said interactions.


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