The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2012
Filed:
Feb. 01, 2008
Hindrik Willem DE Vries, Tilburg, NL;
Bruno Alexander Korngold, Drunen, NL;
Hindrik Willem De Vries, Tilburg, NL;
Bruno Alexander Korngold, Drunen, NL;
Fujifilm Manufacturing Europe B.V., Tilburg, NL;
Abstract
Plasma treatment apparatus and method for treatment of a surface of a substrate. A dielectric barrier discharge electrode structure is provided having a treatment space () and comprising a first electrode () and a second electrode (), and a power supply () connected to the first electrode () and the second electrode () for generating an atmospheric pressure plasma in the treatment space (). The plasma treatment apparatus further comprises a magnetic layer () provided on a surface of at least the first electrode (). The first electrode () is arranged to receive, in operation, the substrate () to be treated and a mask device () in contact with the substrate (), the mask device () interacting with the magnetic layer ().