The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2009

Filed:

Sep. 30, 2003
Applicants:

Hindrik Willem DE Vries, Tilburg, NL;

Fuyuhiko Mori, Tilburg, NL;

Eugen Aldea, Eindhoven, NL;

Mauritius Cornelius Maria Van DE Sanden, Tilburg, NL;

Inventors:

Hindrik Willem De Vries, Tilburg, NL;

Fuyuhiko Mori, Tilburg, NL;

Eugen Aldea, Eindhoven, NL;

Mauritius Cornelius Maria Van De Sanden, Tilburg, NL;

Assignee:

Fuji Photo Film B.V., Tiburg, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05H 1/24 (2006.01);
U.S. Cl.
CPC ...
Abstract

Method and arrangement () for generating an atmospheric pressure glow plasma APG (), where in a plurality of electrodes, () are arranged defining a discharge space () for forming said plasma (). The electrodes () are connected to a power supply () providing an AC-voltage having a frequency of at least 50 kHz to the electrodes (). A gaseous substance () is provided in said discharge space and comprises t least one of a group of argon, nitrogen and air.


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