The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2015

Filed:

Apr. 24, 2012
Applicants:

Serguei Starostine, Tilburg, NL;

Hindrik DE Vries, Tilburg, NL;

Inventors:

Serguei Starostine, Tilburg, NL;

Hindrik De Vries, Tilburg, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3105 (2006.01); H01L 21/02 (2006.01); C23C 16/40 (2006.01); C23C 16/56 (2006.01); H01J 37/32 (2006.01); H01L 29/40 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02247 (2013.01); C23C 16/401 (2013.01); C23C 16/56 (2013.01); H01J 37/32018 (2013.01); H01L 29/408 (2013.01);
Abstract

The invention provides a method for manufacturing a barrier layer on a substrate, the method comprising: —providing a substrate with an inorganic oxide layer having a pore volume between 0.3 and 10 vol. %; —treating said substrate with an inorganic oxide layer in a glow discharge plasma, said plasma being generated by at least two electrodes in a treatment space formed between said two electrodes, said treatment space also being provided with a gas comprising Nitrogen compounds; and —the treating of the substrate in said treatment space is done at a temperature below 150° C., e.g. below 100° C. The invention further provides a device for manufacturing a barrier layer on a substrate.


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