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For the Inventor, By the Inventor

Heidenheim, Germany

Helmut Beierl

This inventor holds 24 USPTO granted patents, primarily in Microlithography Systems. Top assignees: Carl-Zeiss-Smt Ag, Carl Zeiss Smt Gmbh, Carl-Zeiss-Stiftung. Active years: 2002-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Helmut Beierl. Retrieved from https://idiyas.com/inventor/helmut-beierl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 24

% Patents Active = 50.0

Average Co-Inventor Count = 4.2

ph-index = 11

Forward Citations = 324(Granted Patents)


Location History:

  • Heindenheim, DE (2002)
  • Heidenheim an der Brenz, DE (2004)
  • Heidenheim, DE (2002 - 2015)

Company Filing History:

goldMedal9 out of 461 
 
Carl-Zeiss-Smt Ag
 patents
silverMedal6 out of 1,477 
 
Carl Zeiss Smt Gmbh
 patents
bronzeMedal5 out of 702 
 
Carl-Zeiss-Stiftung
 patents
4. 3 out of 22 
 
Carl Zeiss Semiconductor Manufacturing Technologies Ag
 patents
5. 1 out of 834,453 
Other
 patents

Years Active: 2002-2015

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Areas of Expertise:
Microlithography
Projection Lens
Exposure System
Catadioptric
Aspheric Lens
Immersion Lithography
Optical System
Geometric Beam Splitting
Reduction Objective
Projection Objective
Exposure Apparatus
Projection Equipment
24 patents (USPTO):Explore Patents
1. 9164396 - Projection lens system of a microlithographic projection exposure installation (2015-10-20),
2. 9146475 - Projection exposure system and projection exposure method (2015-09-29),
3. 8982325 - Microlithographic projection exposure apparatus (2015-03-17),
4. 8436982 - Projection objective for microlithography (2013-05-07),
5. 8319944 - Projection lens system of a microlithographic projection exposure installation (2012-11-27),
6. 8107054 - Microlithographic projection exposure apparatus (2012-01-31),
7. 7782440 - Projection lens system of a microlithographic projection exposure installation (2010-08-24),
8. 7426082 - Catadioptric projection objective with geometric beam splitting (2008-09-16),
9. 7408716 - Refractive projection objective for immersion lithography (2008-08-05),
10. 7187503 - Refractive projection objective for immersion lithography (2007-03-06),
11. 7154678 - Projection objective having adjacently mounted aspheric lens surfaces (2006-12-26),
12. 7136220 - Catadioptric reduction lens (2006-11-14),
13. 7006304 - Catadioptric reduction lens (2006-02-28),
14. 6995930 - Catadioptric projection objective with geometric beam splitting (2006-02-07),
15. 6985286 - Catadioptric optical system and exposure apparatus having the same (2006-01-10),

Title: Helmut Beierl - Pioneering Inventor from Heidenheim

Introduction: Helmut Beierl is a renowned inventor hailing from Heidenheim, Germany, known for his groundbreaking contributions to various technological fields.

Latest Patents: Helmut Beierl holds several patents in the areas of renewable energy, sustainable transportation, and advanced materials, showcasing his innovative spirit and forward-thinking approach.

Career Highlights: With a career spanning over three decades, Helmut Beierl has worked with leading research institutions and companies to develop cutting-edge solutions that have revolutionized industries worldwide.

Collaborations: Throughout his career, Helmut Beierl has collaborated with top engineers, scientists, and inventors, fostering a culture of innovation and excellence in all his projects.

Conclusion: Helmut Beierl's passion for innovation and his relentless pursuit of technological advancement have solidified his reputation as a pioneering inventor in Heidenheim and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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