The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 07, 2006

Filed:

Dec. 15, 2003
Applicants:

David R. Shafer, Fairfield, CT (US);

Alexander Epple, Aalen, DE;

Aurelian Dodoc, Oberkochen, DE;

Helmut Beierl, Heidenheim, DE;

Wilhelm Ulrich, Aalen, DE;

Inventors:

David R. Shafer, Fairfield, CT (US);

Alexander Epple, Aalen, DE;

Aurelian Dodoc, Oberkochen, DE;

Helmut Beierl, Heidenheim, DE;

Wilhelm Ulrich, Aalen, DE;

Assignee:

Carl Zeiss SMT AG, Oberkochen, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 17/00 (2006.01); G02B 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.


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