The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2012
Filed:
Sep. 15, 2008
Michael Totzeck, Schwaebisch Gmuend, DE;
Aksel Goehnermeier, Essingen-Lauterburg, DE;
Wolfgang Singer, Aalen, DE;
Helmut Beierl, Heidenheim, DE;
Heiko Feldmann, Aalen, DE;
Hans-juergen Mann, Oberkochen, DE;
Jochen Hetzler, Aalen, DE;
Michael Totzeck, Schwaebisch Gmuend, DE;
Aksel Goehnermeier, Essingen-Lauterburg, DE;
Wolfgang Singer, Aalen, DE;
Helmut Beierl, Heidenheim, DE;
Heiko Feldmann, Aalen, DE;
Hans-Juergen Mann, Oberkochen, DE;
Jochen Hetzler, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.