The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2015
Filed:
Oct. 25, 2012
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Helmut Beierl, Heidenheim, DE;
Sascha Bleidistel, Aalen, DE;
Wolfgang Singer, Aalen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Alexander Epple, Aalen, DE;
Norbert Wabra, Werneck, DE;
Susanne Beder, Aalen, DE;
Jochen Weber, Heidenheim-Grosskuchen, DE;
Heiko Feldmann, Aalen, DE;
Baerbel Schwaer, Oberkochen, DE;
Olaf Rogalsky, Oberkochen, DE;
Arif Kazi, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.