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For the Inventor, By the Inventor

Putnam Valley, NY, United States of America

Harald F Okorn-Schmidt

This inventor holds 28 USPTO granted patents, primarily in Semiconductor Processing. Top assignees: International Business Machines Corporation, Lam Research Ag, Globalfoundries Inc.. Active years: 1999-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Harald F Okorn-Schmidt. Retrieved from https://idiyas.com/inventor/harald-f-okorn-schmidt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 28

% Patents Active = 71.4

Average Co-Inventor Count = 5.9

ph-index = 9

Forward Citations = 317(Granted Patents)


Location History:

  • Putnam Valley, NY (US) (1999 - 2011)
  • Klagenfurt, AU (2015)
  • Villach, AT (2016)
  • Klagenfurt, AT (2009 - 2021)

Company Filing History:

goldMedal22 out of 166,425 
 
International Business Machines Corporation
 patents
silverMedal4 out of 113 
 
Lam Research Ag
 patents
bronzeMedal1 out of 5,671 
 
Globalfoundries Inc.
 patents
4. 1 out of 1 
 
Semsyso Gmbh
 patent

Years Active: 1999-2021

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Areas of Expertise:
Wafer Processing
Surface Treatment
Chemical Etching
High-K Dielectrics
Sonic Cleaning
Reactive Sputtering
Contaminant Removal
Silicon Oxide
Silicon Nitride
Dielectric Oxides
Interfacial Oxidation
Etching Residues
28 patents (USPTO):Explore Patents
1. 11164748 - Method and device for plating a recess in a substrate (2021-11-02),
2. 10249521 - Wet-dry integrated wafer processing system (2019-04-02),
3. 9653328 - Method and apparatus for surface treatment using inorganic acid and ozone (2017-05-16),
4. 9472402 - Methods and structures for protecting one area while processing another area on a chip (2016-10-18),
5. 9059000 - Methods and structures for protecting one area while processing another area on a chip (2015-06-16),
6. 8709165 - Method and apparatus for surface treatment using inorganic acid and ozone (2014-04-29),
7. 8668777 - Process for treating a semiconductor wafer (2014-03-11),
8. 7887711 - Method for etching chemically inert metal oxides (2011-02-15),
9. 7497959 - Methods and structures for protecting one area while processing another area on a chip (2009-03-03),
10. 6958506 - High-dielectric constant insulators for feol capacitors (2005-10-25),
11. 6667207 - High-dielectric constant insulators for FEOL capacitors (2003-12-23),
12. 6634371 - Apparatus for removing contaminants from a workpiece using a chemically reactive additive (2003-10-21),
13. 6511873 - High-dielectric constant insulators for FEOL capacitors (2003-01-28),
14. 6444592 - Interfacial oxidation process for high-k gate dielectric process integration (2002-09-03),
15. 6413386 - Reactive sputtering method for forming metal-silicon layer (2002-07-02),

Title: Harald F Okorn-Schmidt: Pioneering Inventor from Putnam Valley

Introduction:

Harald F Okorn-Schmidt is a distinguished inventor known for his groundbreaking contributions to the field of technology and innovation. Hailing from Putnam Valley, NY (US), he has made significant strides in the world of patents and inventions.

Latest Patents:

Harald F Okorn-Schmidt holds several patents in various technological domains, showcasing his versatility and ingenuity in creating novel solutions to complex problems. His recent patents demonstrate his commitment to pushing the boundaries of innovation.

Career Highlights:

Throughout his illustrious career, Harald F Okorn-Schmidt has consistently demonstrated a keen eye for identifying gaps in the market and developing inventive solutions to address them. His innovative spirit has led to the successful commercialization of several groundbreaking technologies.

Collaborations:

Harald F Okorn-Schmidt has collaborated with leading industry experts, researchers, and engineers to bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of his projects and the realization of his innovative ideas.

Conclusion:

In conclusion, Harald F Okorn-Schmidt stands as a visionary inventor whose passion for innovation has reshaped the technological landscape. His dedication to pushing the boundaries of what is possible serves as an inspiration to aspiring inventors and innovators worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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