The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2014
Filed:
Dec. 22, 2010
Applicants:
Harald Okorn-schmidt, Klagenfurt, AT;
Dieter Frank, Velden, AT;
Franz Kumnig, Lieserbruecke, AT;
Inventors:
Assignee:
Lam Research AG, Villach, AT;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23G 1/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
Mixtures containing concentrated sulfuric acid used for stripping photoresist from semiconductor wafer, such as SOM and SPM mixtures, are more quickly removed from a wafer surface using another liquid also containing high concentration of sulfuric acid, with the second liquid furthermore containing controlled small amounts of fluoride ion. The second liquid renders the wafer surface hydrophobic, which permits easy removal of the sulfuric acid therefrom by spinning and/or rinsing.