The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2014
Filed:
Dec. 03, 2010
Applicants:
Harald Okorn-schmidt, Klagenfurt, AT;
Franz Kumning, Lieserbruecke, AT;
Rainer Obweger, Lind im Drautal, AT;
Thomas Wirnsberger, Seeboden, AT;
Inventors:
Harald Okorn-Schmidt, Klagenfurt, AT;
Franz Kumning, Lieserbruecke, AT;
Rainer Obweger, Lind im Drautal, AT;
Thomas Wirnsberger, Seeboden, AT;
Assignee:
Lam Research AG, Villach, AT;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Improved removal of ion-implanted photoresist in a single wafer front-end wet processing station is achieved by dissolving gaseous ozone into relatively cool inorganic acid, dispensing the acid ozone mixture onto a wafer, and rapidly heating the surface of the wafer to a temperature at least 30° C. higher than the temperature of the acid ozone mixture.