The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2003
Filed:
May. 14, 2001
Richard Hilliard Gaylord, III, Essex Junction, VT (US);
Frederick William Kern, Jr., Colchester, VT (US);
Donald Joseph Martin, Fairfield, VT (US);
Harald Franz Okorn-Schmidt, Putnam Valley, NY (US);
John Joseph Snyder, Colchester, VT (US);
William Alfred Syverson, Colchester, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An apparatus for drying one or more workpieces. The apparatus includes the use of a chemically reactive additive to remove contaminants from the wafer surface during processing. In particular, during processing, a wafer is rinsed in a liquid bath and subsequently exposed to a chemically reactive additive. The chemically reactive additive creates a surface tension gradient that physically and chemically alters the properties of the film of the rinse liquid so that the liquid and any contaminants contained therein are removed from the water surface.