Location History:
- Colchester, VT (US) (2002 - 2003)
- Woodstock, CT (US) (2006)
Company Filing History:
Years Active: 2002-2006
Title: John Joseph Snyder: Innovator in Substrate Processing Technologies
Introduction
John Joseph Snyder is a notable inventor based in Colchester, Vermont, who has made significant contributions to the field of substrate processing. With a total of 3 patents to his name, Snyder has developed innovative methods and apparatuses that enhance the efficiency and effectiveness of various processes in the semiconductor industry.
Latest Patents
Snyder's latest patents include a "Method and apparatus for etch rate uniformity control," which outlines a process for controlling substrate processing. This method involves providing a substrate with an upper surface, a lower surface, and an edge. The process includes treating the upper surface with a first fluid while directing a second fluid against a portion of the lower surface near the edge. By controlling the temperature of the second fluid, Snyder's method aims to improve processing in the edge region of the substrate.
Another significant patent is the "Apparatus for removing contaminants from a workpiece using a chemically reactive additive." This apparatus is designed for drying workpieces and utilizes a chemically reactive additive to eliminate contaminants from the wafer surface during processing. The process involves rinsing a wafer in a liquid bath and then exposing it to the additive, which creates a surface tension gradient that effectively removes contaminants.
Career Highlights
Snyder is currently employed at International Business Machines Corporation (IBM), where he continues to innovate and contribute to advancements in technology. His work at IBM has positioned him as a key player in the development of new processes and apparatuses that enhance substrate processing.
Collaborations
Throughout his career, Snyder has collaborated with notable colleagues, including Richard Hilliard Gaylord, III, and Frederick William Kern, Jr. These collaborations have fostered an environment of innovation and have led to the development of groundbreaking technologies in the field.
Conclusion
John Joseph Snyder's contributions to substrate processing technologies through his patents and work at IBM highlight his role as an influential inventor. His innovative methods and apparatuses continue to impact the semiconductor industry positively.