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For the Inventor, By the Inventor

Hopewell Junction, NY, United States of America

Haoren Zhuang

This inventor holds 36 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Semiconductor Manufacturing. Top assignees: Infineon Technologies Ag, Kabushiki Kaisha Toshiba, International Business Machines Corporation. Active years: 2004-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haoren Zhuang. Retrieved from https://idiyas.com/inventor/haoren-zhuang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 36 

% Patents Active = 36.1


Average Co-Inventor Count = 3.6

ph-index = 5

Forward Citations = 88(Granted Patents)


Location History:

  • Tokyo-to, JP (2004 - 2006)
  • Tokyo, JP (2005 - 2006)
  • Wallkill, NY (US) (2006)
  • New York, NY (US) (2008)
  • Walkill, NY (US) (2013)
  • Hopewell Junction, NY (US) (2006 - 2018)

Company Filing History:

goldMedal32 out of 15,036 
 
Infineon Technologies Ag
 patents
silverMedal5 out of 53,276 
 
Kabushiki Kaisha Toshiba
 patents
bronzeMedal4 out of 166,409 
 
International Business Machines Corporation
 patents
4. 4 out of 132,108 
 
Samsung Electronics Co., Ltd.
 patents
5. 2 out of 962 
 
Chartered Semiconductor Manufacturing Ltd (Corporation)
 patents
6. 2 out of 5,671 
 
Globalfoundries Inc.
 patents
7. 1 out of 834,570 
Other
 patents
where one patent can have more than one assignee

Years Active: 2004-2018

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Areas of Expertise:
Etch Stop Liner
Lithography Masks
Metrology Systems
Integrated Circuits
Ferroelectric Capacitors
Feature Patterning
Polysilicon Layer
Non-volatile Memory
Device Fabrication
Doping Profile
Transistor Manufacturing
Hydrogen Damage
36 patents (USPTO):Explore Patents
1. 9899257 - Etch stop liner for contact punch through mitigation in SOI substrate (2018-02-20),
2. 9887135 - Methods for providing variable feature widths in a self-aligned spacer-mask patterning process (2018-02-06),
3. 9070759 - Semiconductor device and method of making same (2015-06-30),
4. 8697339 - Semiconductor device manufacturing methods (2014-04-15),
5. 8394574 - Metrology systems and methods for lithography processes (2013-03-12),
6. 8349528 - Semiconductor devices and methods of manufacturing thereof (2013-01-08),
7. 8219938 - Semiconductor inter-field dose correction (2012-07-10),
8. 8071261 - Lithography masks and methods of manufacture thereof (2011-12-06),
9. 8067135 - Metrology systems and methods for lithography processes (2011-11-29),
10. 8063406 - Semiconductor device having a polysilicon layer with a non-constant doping profile (2011-11-22),
11. 8039203 - Integrated circuits and methods of design and manufacture thereof (2011-10-18),
12. 8007985 - Semiconductor devices and methods of manufacturing thereof (2011-08-30),
13. 7842579 - Method for manufacturing a semiconductor device having doped and undoped polysilicon layers (2010-11-30),
14. 7794903 - Metrology systems and methods for lithography processes (2010-09-14),
15. 7759235 - Semiconductor device manufacturing methods (2010-07-20),

Title: Innovations by Haoren Zhuang: A Trailblazer in Semiconductor Technology

Introduction

Haoren Zhuang, based in Hopewell Junction, NY, has made significant contributions to the field of semiconductor technology, notably holding an impressive total of 36 patents. His work primarily revolves around innovative methods for enhancing semiconductor fabrication processes, which play a crucial role in the advancement of electronics.

Latest Patents

Among his latest innovations is the patent titled "Etch stop liner for contact punch through mitigation in SOI substrate." This invention details a method for forming a shallow trench isolation (STI) in a semiconductor-on-insulator (SOI) substrate. The method includes an etch stop liner designed to prevent punch through during the fabrication process, which enhances the reliability of SOI substrates. Additionally, he has developed methods for providing variable feature widths in a self-aligned spacer-mask patterning process, further showcasing his expertise in designing intricate semiconductor structures.

Career Highlights

Haoren Zhuang has worked with leading companies in the industry, including Infineon Technologies AG and Kabushiki Kaisha Toshiba. His roles at these companies allowed him to develop groundbreaking technologies that have advanced semiconductor manufacturing techniques. His prolific patent portfolio underscores his innovative approaches during his career.

Collaborations

Zhuang has collaborated with experienced professionals in his field, including Ulrich Egger and Jingyu Lian. These partnerships reflect a shared commitment to pushing the boundaries of semiconductor technology and developing solutions that address the challenges within the industry.

Conclusion

Haoren Zhuang's contributions to semiconductor technology underline the importance of innovation and collaboration in driving advancements within the field. His continued work promises to yield further innovations that will affect various applications in electronics and beyond. As the industry evolves, Zhuang's role as an inventor will undoubtedly remain influential.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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