The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 08, 2013

Filed:

Jun. 20, 2011
Applicants:

Matthias Lipinski, Poughkeepsie, NY (US);

Alois Gutmann, Poughkeepsie, NY (US);

Jingyu Lian, Hopewell Junction, NY (US);

Chandrasekhar Sarma, Poughkeepsie, NY (US);

Haoren Zhuang, Hopewell Junction, NY (US);

Inventors:

Matthias Lipinski, Poughkeepsie, NY (US);

Alois Gutmann, Poughkeepsie, NY (US);

Jingyu Lian, Hopewell Junction, NY (US);

Chandrasekhar Sarma, Poughkeepsie, NY (US);

Haoren Zhuang, Hopewell Junction, NY (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2012.01);
U.S. Cl.
CPC ...
Abstract

Semiconductor devices and methods of manufacturing thereof are disclosed. A plurality of features is formed on a workpiece, the plurality of features being located in a first region and a second region of the workpiece. Features in the first region have a first lateral dimension, and features in the second region have a second lateral dimension, wherein the second lateral dimension is greater than the first lateral dimension. The first region is masked, and the second lateral dimension of features in the second region is reduced.


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