Gao Huang

Title: Innovations by Gao Huang in Semiconductor Technology

Introduction

Gao Huang is a prominent inventor based in Guangdong, China, known for his contributions to semiconductor technology. With a total of three patents to his name, he has made significant advancements in the field, particularly in the design and manufacturing of conductive substrates.

Latest Patents

One of Gao Huang's latest patents is titled "Substrate embedded with integrated inductor and manufacturing method thereof." This patent outlines a comprehensive manufacturing method for a substrate that incorporates an integrated inductor. The process involves several steps, including the provision of a bearing plate, the manufacturing of conduction copper columns, and the arrangement of dielectric layers. The method ensures that the surfaces of the copper columns and magnetic materials are flush with the dielectric layer, ultimately leading to the creation of a package substrate.

Another notable patent is the "Conductive substrate and carrier plate wiring structure with filtering function, and manufacturing method of same." This invention describes a method for creating a conductive substrate that features a filtering function. The process includes preparing a core layer, forming conductive holes, and utilizing a sacrificial copper layer. The innovative design incorporates metal posts and insulating layers, culminating in a flattened structure that enhances the substrate's functionality.

Career Highlights

Gao Huang is currently employed at Zhuhai Access Semiconductor Co., Ltd., where he continues to develop cutting-edge technologies in the semiconductor industry. His work has positioned him as a key figure in advancing the capabilities of conductive substrates.

Collaborations

Gao Huang collaborates with talented individuals in his field, including Benxia Huang and Xianming Chen. Their combined expertise fosters an environment of innovation and creativity, driving forward the development of new technologies.

Conclusion

Gao Huang's contributions to semiconductor technology through his patents demonstrate his commitment to innovation and excellence. His work not only enhances the functionality of conductive substrates but also paves the way for future advancements in the industry.