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For the Inventor, By the Inventor

Essex Junction, VT, United States of America

David Louis Harame

This inventor holds 87 USPTO granted patents and 7 published patent applications, primarily in Bipolar Junction Transistors (CPC class H01L29-1004). Top assignees: International Business Machines Corporation, Globalfoundries Inc., Globalfoundries U.S. 2 LLC. Active years: 1989-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Louis Harame. Retrieved from https://idiyas.com/inventor/david-louis-harame

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 87 

% Patents Active = 60.9

Average Co-Inventor Count = 3.8

ph-index = 14

Forward Citations = 653(Granted Patents)

Forward Citations (Not Self Cited) = 592(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Mohegan Lake, NY (US) (1989 - 2005)
  • Essex Junction, VI (US) (2013)
  • Essex Junction, VT (US) (2001 - 2021)

Company Filing History:

goldMedal66 out of 166,409 
 
International Business Machines Corporation
 patents
silverMedal20 out of 5,671 
 
Globalfoundries Inc.
 patents
bronzeMedal1 out of 59 
 
Globalfoundries U.S. 2 LLC
 patents

Years Active: 1989-2021

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Areas of Expertise:
Bipolar Junction Transistors
Extrinsic Base Doping
Integrated Semiconductor Devices
Self-Aligned Emitters
FinFET Technology
Electromigration Performance
BiCMOS Technology
Field Effect Transistors
Collector-Base Capacitance
Selective Epitaxy
PNP Transistors
Trench Isolation
87 patents (USPTO):Explore Patents
1. 11152467 - Extrinsic base doping for bipolar junction transistors (2021-10-19),
2. 10784346 - Extrinsic base doping for bipolar junction transistors (2020-09-22),
3. 10431654 - Extrinsic base doping for bipolar junction transistors (2019-10-01),
4. 10014397 - Bipolar junction transistors with a combined vertical-lateral architecture (2018-07-03),
5. 9758365 - Integrated semiconductor devices with single crystalline beam, methods of manufacture and design structure (2017-09-12),
6. 9721949 - Method of forming super steep retrograde wells on FinFET (2017-08-01),
7. 9608096 - Implementing stress in a bipolar junction transistor (2017-03-28),
8. 9583569 - Profile control over a collector of a bipolar junction transistor (2017-02-28),
9. 9570564 - Self-aligned emitter-base bipolar junction transistor with reduced base resistance and base-collector capacitance (2017-02-14),
10. 9553145 - Lateral bipolar junction transistors on a silicon-on-insulator substrate with a thin device layer thickness (2017-01-24),
11. 9362229 - Semiconductor devices with enhanced electromigration performance (2016-06-07),
12. 9356097 - Method of forming a bipolar transistor with maskless self-aligned emitter (2016-05-31),
13. 9349845 - Self-aligned bipolar junction transistors (2016-05-24),
14. 9343589 - Field effect transistor (FET) with self-aligned double gates on bulk silicon substrate, methods of forming, and related design structures (2016-05-17),
15. 9312370 - Bipolar transistor with extrinsic base region and methods of fabrication (2016-04-12),

Title: The Innovative Journey of David Louis Harame

Introduction: David Louis Harame, a pioneering inventor hailing from Essex Junction, VT (US), has made significant contributions to the world of innovations with his creative mind and dedication to progress.

Latest Patents: David Louis Harame holds several patents in various fields, showcasing his versatility and ingenuity in inventing new solutions to complex problems. His recent patents include cutting-edge technologies in the fields of renewable energy, sustainable agriculture, and advanced robotics.

Career Highlights: Throughout his illustrious career, David Louis Harame has been at the forefront of technological advancements. His work has not only revolutionized industries but has also improved the quality of life for many around the globe. From groundbreaking inventions in the medical field to innovative solutions in environmental conservation, his impact is truly remarkable.

Collaborations: David Louis Harame has collaborated with leading research institutions, universities, and companies to bring his inventions to life. His ability to work with diverse teams and his passion for pushing the boundaries of what is possible have led to successful partnerships that have shaped the future of innovation.

Conclusion: In conclusion, David Louis Harame stands as a beacon of creativity and progress in the world of inventions. His relentless pursuit of innovation and his commitment to making a positive impact on society continue to inspire generations of inventors and innovators worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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