The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 19, 2021

Filed:

Jul. 19, 2019
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Renata Camillo-Castillo, Essex Junction, VT (US);

David L. Harame, Essex Junction, VT (US);

Qizhi Liu, Lexington, MA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/10 (2006.01); H01L 21/225 (2006.01); H01L 21/324 (2006.01); H01L 29/06 (2006.01); H01L 29/08 (2006.01); H01L 29/66 (2006.01); H01L 29/737 (2006.01); H01L 29/732 (2006.01);
U.S. Cl.
CPC ...
H01L 29/1004 (2013.01); H01L 21/2257 (2013.01); H01L 21/324 (2013.01); H01L 29/0653 (2013.01); H01L 29/0821 (2013.01); H01L 29/66242 (2013.01); H01L 29/7371 (2013.01); H01L 29/66234 (2013.01); H01L 29/732 (2013.01);
Abstract

A device structure for a bipolar junction transistor includes a base layer made of a semiconductor material. An emitter is disposed on a first portion of the base layer. A dopant-containing layer is disposed on a second portion of the base layer. A hardmask is disposed on the base layer. The hardmask includes a window aligned with the second portion of the base layer. Deposits of the dopant-containing layer are limited to exposed surfaces of: the first portion that is disposed on a top surface of the base layer inside of the window.


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