Chung-Heon Lee

This inventor holds 14 USPTO granted patents, primarily in Hardmask Composition. Top assignees: Cheil Industries Inc., Samsung Sdi Co., Inc.. Active years: 2014-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chung-Heon Lee. Retrieved from https://idiyas.com/inventor/chung-heon-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 14

% Patents Active = 100.0

Average Co-Inventor Count = 7.7

ph-index = 3

Forward Citations = 18(Granted Patents)

Location History:

Uiwang-si, KR (2014 - 2019)
Suwon-si, KR (2016 - 2019)

Company Filing History:

10 out of 787

Cheil Industries Inc.

patents

4 out of 7,663

Samsung Sdi Co., Inc.

patents

Years Active: 2014-2019

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Areas of Expertise:

Monomer

Pattern Formation

Semiconductor Device

Hardmask Composition

Layer Structure

Integrated Circuit

Dual Damascene

Composition Method

14 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10345706 - Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition (2019-07-09),

2. 10312074 - Method of producing layer structure, layer structure, and method of forming patterns (2019-06-04),

3. 10018914 - Hardmask composition and method of forming patterns using the hardmask composition (2018-07-10),

4. 9725389 - Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition (2017-08-08),

5. 9683114 - Monomer for hardmask composition, hardmask composition including the monomer, and method of forming patterns using the hardmask composition (2017-06-20),

6. 9665003 - Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns (2017-05-30),

7. 9556094 - Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition (2017-01-31),

8. 9529257 - Hard mask composition and method for forming pattern using same (2016-12-27),

9. 9371444 - Hardmask composition and method of forming patterns using the hardmask composition (2016-06-21),

10. 9359276 - Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition (2016-06-07),

11. 9284245 - Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition (2016-03-15),

12. 8952373 - Hardmask composition and method of forming patterns and semiconductor integrated circuit device including the patterns (2015-02-10),

13. 8900997 - Method for forming a dual damascene structure of a semiconductor device, and a semiconductor device therewith (2014-12-02),

14. 8741540 - Hard mask composition, method of forming a pattern, and semiconductor integrated circuit device including the pattern (2014-06-03),

Title: Innovations of Chung-Heon Lee

Introduction

Chung-Heon Lee is a prominent inventor based in Uiwang-si, South Korea. He has made significant contributions to the field of materials science, particularly in the development of hardmask compositions. With a total of 14 patents to his name, Lee's work has had a substantial impact on the industry.

Latest Patents

Among his latest patents, Lee has developed a monomer for hardmask composition and a hardmask composition that includes this monomer. This innovation is crucial for forming patterns in various applications. Additionally, he has patented a method of producing a layer structure, which involves applying a first composition containing an organic compound on a substrate with multiple patterns. This process includes the application of a solvent to remove part of the first organic layer and the application of a second composition to form a second organic layer through a curing process.

Career Highlights

Chung-Heon Lee has worked with notable companies such as Cheil Industries Inc. and Samsung SDI Co., Inc. His experience in these leading firms has allowed him to refine his expertise and contribute to groundbreaking advancements in his field.

Collaborations

Lee has collaborated with talented individuals in his field, including Yun-Jun Kim and Yong-Woon Yoon. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Chung-Heon Lee's contributions to the field of materials science and his innovative patents highlight his role as a leading inventor. His work continues to influence advancements in technology and materials development.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]