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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9556094 B1

PDFFull Text
Date of Patent:
Jan. 31, 2017

Filed:

Jun. 04, 2013

Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition

Applicant:

Cheil Industries Inc., Gumi-si, Gyeongsangbuk-do, KR;

Inventors:

Yun-Jun Kim, Suwon-si, KR;

Hyo-Young Kwon, Suwon-si, KR;

Hea-Jung Kim, Suwon-si, KR;

Chung-Heon Lee, Suwon-si, KR;

Youn-Jin Cho, Suwon-si, KR;

Yoo-Jeong Choi, Suwon-si, KR;

Assignee:

Cheil Industries, Inc., Gumi-Si, Gyeongsangbuk-do, KR;

Attorney:

Lee & Morse, P.C.

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/11 (2006.01); C07C 39/14 (2006.01); G03F 7/40 (2006.01); C09D 173/00 (2006.01); C07C 39/12 (2006.01); C07C 33/26 (2006.01); C07C 43/23 (2006.01); G03F 7/09 (2006.01); H01L 21/027 (2006.01); H01L 21/311 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C07C 39/14 (2013.01); C07C 33/26 (2013.01); C07C 39/12 (2013.01); C07C 43/23 (2013.01); C09D 173/00 (2013.01); G03F 7/09 (2013.01); G03F 7/11 (2013.01); G03F 7/40 (2013.01); H01L 21/0274 (2013.01); H01L 21/02118 (2013.01); H01L 21/02282 (2013.01); H01L 21/31144 (2013.01); C07C 2103/50 (2013.01); C07C 2103/52 (2013.01); C07C 2103/54 (2013.01);
Abstract

Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the hardmask composition. In the above Chemical Formula 1, Ato A, Xto X, L, L, n and m are the same as described in the detailed description.

Find Patent Forward Citations

Kim, Yun-Jun. (2017). Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition (U.S. Patent No. 9556094). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9556094

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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