Hyo-Young Kwon

This inventor holds 13 USPTO granted patents and 2 published patent applications. Top assignees: Cheil Industries Inc., Samsung Sdi Co., Inc.. Active years: 2015-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hyo-Young Kwon. Retrieved from https://idiyas.com/inventor/hyo-young-kwon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 13 (Patent Applications = 2)

% Patents Active = 100.0

Average Co-Inventor Count = 5.7

ph-index = 2

Forward Citations = 13(Granted Patents)

Location History:

Uiwang-si, KR (2015 - 2017)
Suwon-si, KR (2017 - 2019)

Company Filing History:

7 out of 787

Cheil Industries Inc.

patents

6 out of 7,663

Samsung Sdi Co., Inc.

patents

Years Active: 2015-2019

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13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10323124 - Polymer, organic layer composition, organic layer, and method of forming patterns (2019-06-18),

2. 10066057 - Organic layer composition, organic layer, and method of forming patterns (2018-09-04),

3. 9971243 - Polymer, organic layer composition, organic layer, and method of forming patterns (2018-05-15),

4. 9862668 - Monomer, polymer, organic layer composition, organic layer, and method of forming patterns (2018-01-09),

5. 9758612 - Polymer, organic layer composition, organic layer, and method of forming patterns (2017-09-12),

6. 9725389 - Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition (2017-08-08),

7. 9606438 - Resist underlayer composition, method of forming patterns, and semiconductor integrated circuit device including the pattern (2017-03-28),

8. 9593205 - Polymer, organic layer composition, organic layer, and method of forming patterns (2017-03-14),

9. 9556094 - Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition (2017-01-31),

10. 9359276 - Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition (2016-06-07),

11. 9329475 - Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device (2016-05-03),

12. 9195136 - Resist underlayer composition, method of forming patterns and semiconductor integrated circuit device including the patterns (2015-11-24),

13. 8956790 - Positive photosensitive resin composition, and organic insulator film for display device and display device fabricated using the same (2015-02-17),

Title: Hyo-Young Kwon: Pioneering Inventor from Suwon-si, South Korea

Introduction: Hyo-Young Kwon is a distinguished inventor hailing from Suwon-si, South Korea, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Hyo-Young Kwon holds several patents in the areas of artificial intelligence, robotics, and renewable energy, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Kwon has worked with leading tech companies in South Korea, spearheading projects that have revolutionized the industry and earned him international recognition.

Collaborations: Throughout his career, Hyo-Young Kwon has collaborated with top researchers, engineers, and scientists, fostering a culture of innovation and knowledge-sharing that has led to numerous successful projects and inventions.

Conclusion: Hyo-Young Kwon's passion for innovation, coupled with his relentless drive to push the boundaries of technology, has solidified his reputation as a visionary inventor in Suwon-si and beyond.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

2 patents pending: