The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2017
Filed:
Nov. 29, 2012
Applicant:
Cheil Industries Inc., Gyeongsangbuk-do, KR;
Inventors:
Yun-Jun Kim, Uiwang-si, KR;
Hwan-Sung Cheon, Uiwang-si, KR;
Youn-Jin Cho, Uiwang-si, KR;
Yong-Woon Yoon, Uiwang-si, KR;
Chung-Heon Lee, Uiwang-si, KR;
Hyo-Young Kwon, Uiwang-si, KR;
Yoo-Jeong Choi, Uiwang-si, KR;
Assignee:
Cheil Industries, Inc., Gumi-Si, Gyeongsangbuk-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 39/21 (2006.01); C07C 39/205 (2006.01); C07C 33/26 (2006.01); G03F 7/039 (2006.01); G03F 7/11 (2006.01); H01L 21/027 (2006.01); C07C 39/225 (2006.01); G03F 1/00 (2012.01); G03F 7/09 (2006.01); G03F 7/20 (2006.01); H01L 21/02 (2006.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
C07C 39/21 (2013.01); C07C 39/225 (2013.01); G03F 1/00 (2013.01); G03F 7/094 (2013.01); G03F 7/20 (2013.01); H01L 21/02118 (2013.01); H01L 21/02282 (2013.01); H01L 21/0332 (2013.01); H01L 21/31144 (2013.01);
Abstract
Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. In Chemical Formula 1, A, A', L and n are the same as in the detailed description.