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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9665003 B1

PDFFull Text
Date of Patent:
May. 30, 2017

Filed:

Apr. 28, 2014

Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns

Applicants:

Yoo-jeong Choi, Uiwang-si, KR;

Yun-jun Kim, Uiwang-si, KR;

Go-un Kim, Uiwang-si, KR;

Young-min Kim, Uiwang-si, KR;

Hea-jung Kim, Uiwang-si, KR;

Joon-young Moon, Uiwang-si, KR;

Yo-choul Park, Uiwang-si, KR;

Yu-shin Park, Uiwang-si, KR;

You-jung Park, Uiwang-si, KR;

Hyun-ji Song, Uiwang-si, KR;

Seung-wook Shin, Uiwang-si, KR;

Yong-woon Yoon, Uiwang-si, KR;

Chung-heon Lee, Uiwang-si, KR;

Seung-hee Hong, Uiwang-si, KR;

Inventors:

Yoo-Jeong Choi, Uiwang-si, KR;

Yun-Jun Kim, Uiwang-si, KR;

Go-Un Kim, Uiwang-si, KR;

Young-Min Kim, Uiwang-si, KR;

Hea-Jung Kim, Uiwang-si, KR;

Joon-Young Moon, Uiwang-si, KR;

Yo-Choul Park, Uiwang-si, KR;

Yu-Shin Park, Uiwang-si, KR;

You-Jung Park, Uiwang-si, KR;

Hyun-Ji Song, Uiwang-si, KR;

Seung-Wook Shin, Uiwang-si, KR;

Yong-Woon Yoon, Uiwang-si, KR;

Chung-Heon Lee, Uiwang-si, KR;

Seung-Hee Hong, Uiwang-si, KR;

Assignee:

Cheil Industries, Inc., Gumi-Si, Kyeongsangbuk-do, KR;

Attorney:

Lee & Morse, P.C.

Primary Examiner:

Sin Lee

Int. Cl.
CPC ...
G03F 7/09 (2006.01); G03F 7/40 (2006.01); G03F 7/11 (2006.01); G03F 7/30 (2006.01); G03F 7/16 (2006.01); G03F 7/36 (2006.01);
U.S. Cl.
CPC ...
G03F 7/094 (2013.01); G03F 7/09 (2013.01); G03F 7/091 (2013.01); G03F 7/11 (2013.01); G03F 7/162 (2013.01); G03F 7/30 (2013.01); G03F 7/36 (2013.01); G03F 7/40 (2013.01);
Abstract

A hardmask composition includes a monomer represented by the following Chemical Formula 1, a polymer including a moiety represented by the following Chemical Formula 2, a polymer including a moiety represented by the following Chemical Formula 3, or a combination thereof, and a solvent,

Find Patent Forward Citations

Choi, Yoo-Jeong. (2017). Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns (U.S. Patent No. 9665003). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9665003

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