Company Filing History:

5 out of 787

Cheil Industries Inc.

patents

2 out of 131,214

Samsung Electronics Co., Ltd.

Years Active: 2014-2019

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8 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 10345706 - Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition (2019-07-09),

2. 9890255 - Modified hydrogenated polysiloxazane, composition comprising same for forming silica-based insulation layer, method for preparing composition for forming (2018-02-13),

3. 9845444 - Cleaning composition after chemical mechanical polishing of organic film and cleaning method using the same (2017-12-19),

4. 9738787 - Composition for forming silica-based insulating layer, method for preparing composition for forming silica-based insulating layer, silica-based insulating layer, and method for manufacturing silica-based insulating layer (2017-08-22),

5. 9665003 - Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns (2017-05-30),

6. 9312122 - Rinse liquid for insulating film and method of rinsing insulating film (2016-04-12),

7. 9240443 - Process of preparing a gap filler agent, a gap filler agent prepared using same, and a method for manufacturing semiconductor capacitor using the gap filler agent (2016-01-19),

8. 8685272 - Composition for etching silicon oxide layer, method for etching semiconductor device using the same, and composition for etching semiconductor device (2014-04-01),

Title: The Innovative Genius of Go-Un Kim

Introduction

Go-Un Kim, an esteemed inventor based in Uiwang-si, South Korea, has made significant contributions to the field of material science, particularly in the realm of chemical compositions. With a remarkable portfolio of 8 patents, Kim has established himself as a pioneering figure in developing advanced materials for various applications.

Latest Patents

Among his latest innovations is a groundbreaking monomer for hardmask composition, which contributes to the efficiency and effectiveness of pattern formation in semiconductor manufacturing. This monomer is represented by a specific chemical formula that enhances the properties of hardmask materials. Additionally, Kim has developed a modified hydrogenated polysiloxazane, which is synthesized by reacting hydrogenated polysiloxazane with silane compounds such as polysilane and polycyclosilane. This innovative composition significantly reduces film shrinkage ratio, proving extremely beneficial in forming silica-based insulation layers, thus paving the way for advancements in semiconductor technology.

Career Highlights

Throughout his professional journey, Go-Un Kim has been associated with reputable companies including Cheil Industries Inc. and Samsung Electronics Co., Ltd. His experience in these organizations has undoubtedly contributed to his expertise and understanding of material applications in high-tech environments. His inventive spirit and understanding of the intricacies involved in material manipulation have allowed him to pursue innovative solutions to complex challenges in his field.

Collaborations

Kim's work has often seen him collaborate with talented individuals in the industry. Notable colleagues such as Hyun-Ji Song and Seung-Hee Hong have joined him in various projects, contributing to the shared goal of pushing the boundaries of what is possible within material science. These partnerships have fostered an environment of creativity and innovation, which is instrumental in the development of new technologies.

Conclusion

Go-Un Kim continues to exemplify the spirit of innovation with his remarkable achievements and ongoing dedication to research and development. His extensive work with novel chemical compositions demonstrates his significant impact on the field and the potential for future advancements. As he forges ahead, the inventions and patents attributed to him will undoubtedly influence and inspire the next generation of inventors and researchers in material science.

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