The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2018
Filed:
Jul. 15, 2013
Cheil Industries Inc., Gumi-si, Gyeongsangbuk-do, KR;
Hyun-Ji Song, Suwon-si, KR;
Eun-Su Park, Suwon-si, KR;
Sang-Hak Lim, Suwon-si, KR;
Taek-Soo Kwak, Suwon-si, KR;
Go-Un Kim, Suwon-si, KR;
Mi-Young Kim, Suwon-si, KR;
Bo-Sun Kim, Suwon-si, KR;
Bong-Hwan Kim, Suwon-si, KR;
Yoong-Hee Na, Suwon-si, KR;
Jin-Hee Bae, Suwon-si, KR;
Jin-Woo Seo, Suwon-si, KR;
Hui-Chan Yun, Suwon-si, KR;
Han-Song Lee, Suwon-si, KR;
Jong-Dae Jeon, Suwon-si, KR;
Kwen-Woo Han, Suwon-si, KR;
Seung-Hee Hong, Suwon-si, KR;
Byeong-Gyu Hwang, Suwon-si, KR;
CHEIL INDUSTRIES, INC., Gumi-Si, Gyeongsangbuk-Do, KR;
Abstract
Disclosed is modified hydrogenated polysiloxazane prepared by reacting hydrogenated polysiloxazane with a silane compound selected from polysilane, polycyclosilane, and a silane oligomer. The modified hydrogenated polysiloxazane has a small mole ratio of nitrogen atoms relative to silicon atoms and may remarkably deteriorate a film shrinkage ratio when included in a composition for forming a silica-based insulation layer to form a silica-based insulation layer.